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A very compact atomic layer deposition device with a rich process recipe.
Compact tabletop ALD. It can be used for various device development such as surface protection and modification by film formation on semiconductor devices, organic solar cells, nanowires, quantum dots, and more. The process has been developed at a material development base for ALD and CVD. We are continuously increasing the recipes and also accept new process development requests.
It is ideal for film formation on substrates with complex shapes and can also accommodate resin substrates with low-temperature film formation. Additionally, it produces thin films with excellent gas barrier properties.
ALD (Atomic Layer Deposition) is a method for film formation that deposits a single atomic layer in one cycle, forming a thin film by repeating the cycles. It enables uniform layer control at the atomic layer level, allowing for the formation of high-quality thin films with excellent step coverage. 【Features】 ○ Ideal for film deposition on complex-shaped substrates ○ Compatible with resin substrates due to low-temperature deposition ○ Thin films with excellent gas barrier properties can be obtained For more details, please contact us or download the catalog.
Excellent step coverage and precise film thickness control! High-quality film formation is possible.
The "AFALD-8" is an atomic layer deposition device that enables film formation with atom-level thickness control on complex three-dimensional structures. It allows for high-quality thin film deposition in milliseconds, achieving stable film formation with low damage. It features user-friendly software and highly flexible configuration options. 【Features】 ■ Step coverage ■ High precision thickness control ■ Pinhole-free ■ Low damage ■ Reduced raw material costs *For more details, please refer to the catalog or feel free to contact us.
Reliability and quality of Dublin you can count on! Capable of manufacturing conductive and insulating material coatings.
We would like to introduce our semiconductor circuit formation technology, "ALD (Atomic Layer Deposition)." Semiconductors are precision-finished products designed to exhibit high accuracy and optimal performance. With ALD (Atomic Layer Deposition), we can produce thin films of conductive or insulating materials that are uniformly coated with nanometer-sized structures. [Features] ■ Production of thin films uniformly coated with nanometer-sized structures *For more details, please refer to the related links or feel free to contact us.
Assistance with film formation on various samples using the requested precursor. Capable of live demonstrations, comparative evaluations based on parameters, and film thickness measurements.
At Watty, we offer a "contract film deposition service" using ALD equipment. We can deposit various oxide and nitride films such as Al2O3, TiO2, ZrO2, HfO2, RuO2, SiO2, and TiN. The sizes we can accommodate range from small chips to pipes and films, up to 300mm. We respond to various needs, including assistance with film deposition on various samples using your desired precursors, live demonstrations with customer attendance, and evaluations based on your preferred recipes and parameters. ★ If you would like to know more about our services or are considering making a request, please feel free to contact us using the "Contact Us" button below. 【Features】 ■ Capable of depositing various oxide and nitride films (Al2O3, TiO2, ZrO2, HfO2, RuO2, SiO2, TiN, etc.) ■ Can accommodate sizes from small chips to pipes and films, up to 300mm ■ Our technicians provide support for recipe creation and parameter settings ■ We can also accommodate the use of your own precursors ■ Regular small-lot production is possible *For more details, please refer to the PDF document or feel free to contact us.
